Electron Beam Photoresist - SU-8 GM1010 / HSQ / XR-1541-002/004/006 / HSQ Fox-15/16 / PMMA Series

Suitable for metal patterning in MEMS, packaging, biochip processes to avoid dry etching

适用于MEMS、封装、生物芯片等工艺金属图形化避免使用干法刻蚀工艺

适用于MEMS、封装、生物芯片等工艺金属图形化避免使用干法刻蚀工艺

进口Microchem SU-8光刻胶系列，克服了普通光刻胶采用UV光刻深宽比不足的问题，在近紫外光（365nm-400nm）范围内光吸收度很低，且整个光刻胶层所获得的曝光量均匀一致，可得到具有垂直侧壁和高深宽比的厚膜图形。

Imported SU-8 photoresist series solves the insufficient aspect ratio issue of standard photoresists under UV lithography. It exhibits very low light absorption in the near-ultraviolet range (360nm-400nm) and delivers uniform exposure across the entire photoresist layer, enabling thick-film patterns with vertical sidewalls and high aspect ratios.

光刻胶性能优异，种类繁多，满足不同工艺的多样性要求 • 包装规格灵活多样 (30ml, 100ml, 250ml, 500ml, 1L, 2.5L 等 )，适合多种规模的科研 / 生产需求

The photoresists deliver outstanding performance with abundant types to meet diverse requirements of various processes

光刻胶性能优异，种类繁多，满足不同工艺的多样性要求

光刻胶产品种类齐全，可以满足用户的各种个性化需求。